On the line, a 5% temperature swing during photoresist soft bake will move critical dimensions—fast. And the OLED stack will show it, right away. The dryer has to hit setpoint, hold it, and repeat it, shift after shift. We built our OLED manufacturing drying lamp for exactly that reality. What matters under the hood We run NIR with tight spectral control, so the energy lands where the photoresist and substrate absorb it, not into heating the chamber. Aim is wafer-level thermal uniformity of ±0.1°C, with setpoint repeatability to match. Output stays stable around the clock, with 5,000+ hours between output maintenance and under 5% intensity drift. The assembly is cleanroom-compatible for Class 1–100, and the design doesn’t make particles—no outgassing, no flaking, no hot spots. Why it fits OLED lithography and photoresist processing In OLED lithography, you need consistent soft bake and hard bake profiles to hold thickness, adhesion, and edge bead removal. This lamp keeps the thermal budget within spec, so exposure latitude stays uniform and you see fewer rework lots. The fast thermal response cuts cycle time, and the focused energy profile trims energy draw. The process window opens up, yield improves, and the line runs with fewer bake-related excursions. What to expect when you put it in The lamp is engineered to retrofit into existing dryers and tracks, but integration still depends on chamber geometry and airflow. Plan a short commissioning window to tune the profile for your resist stack and substrate stack-up. Once aligned, maintenance is predictable—replace lamps on schedule, keep optics clean, and the system will hold the numbers you need.